Events Archive

Register as participant: http://www.conftool.com/eosam2016

General Chair: Seppo Honkanen, Microsoft (FI)
General Co-Chair: Jürgen Jahns, Fern Universität in Hagen (DE)
Local Scientific Chair: Rainer Schuhmann, Berliner Glas KGaA (DE)

 

The European Optical Society (EOS) will return to Berlin 26-30 September 2016, on the 25th Anniversary of the EOS. Germany, with a long tradition in optics and photonics, and Berlin, with its many research institutes and companies, serves as an ideal place for the EOS Bi-Annual Meeting. We are very happy to once again enjoy the excellent conference facilities of the Germany’s leading Science- and Technology Park Berlin-Adlershof. The meeting will include tutorials for students, various topical meetings, workshops, Fellows ceremony, Award ceremonies, and an Industrial Exhibition.

• TOM 1 - Silicon Photonics and Guided-Wave Optics
• TOM 2 - Freeform Optics NEW!
• TOM 3 - Optical System Design and Tolerancing
• TOM 4 - Diffractive Optics
• TOM 5 - Trends in Resonant Nanophotonics
• TOM 6 - Frontiers in Optical Metrology
• TOM 7 - Organic & Hybrid Semiconductor Materials and Devices
• TOM 8 - Adaptive Optics and Advanced Illumination Imaging

Keynote speech by Dr. Eric Betzig, Nobel Prize Winner 2014 (TOM 8 - Adaptive Optics and Advanced Illumination Imaging) on Tuesday, 27 September 2016: Imaging Life at High Spatiotemporal Resolution

Conference Program

Onsite Program

Chairs

• Joerg Petschulat, Carl Zeiss AG (DE)
• Allard Mosk, University of Utrecht (NL)

Program Committee

• Michel Verhaegen, TU Delft (NL)
• Martin Booth, University of Oxford (UK)
• Chris Dainty, University College London (UK)
• Christoph Skupsch, Fraunhofer Institute for Photonic Microsystems (DE)
• Alfredo Dubra, Medical College of Wisconsin (US)

Keynote Speaker

• Eric Betzig, Janelia Research Campus, Howard Hughes Medical Institute (US)

Invited Speakers

• Christophe Moser, EPFL (CH)
• Tomas Cizmar, University of Dundee (UK)

Synopsis

Advanced microscopy methods rely increasingly on adaptive compensation of aberrations and on advanced illumination to increase resolution and reduce the effects of scattering.

Chairs

• Riad Haidar, ONERA (FR)
• Nicolas Bonod, Institut Fresnel (FR)
• Femius Koenderink, AMOLF (NL)

Program Committee

• Alexandra Boltasseva, Purdue University (UK)
• Kurt Busch, Humboldt-Universität zu Berlin (DE)
• Andrea Fiore, Technische Universiteit Eindhoven (NL)
• Stephan Goetzinger, Max Planck Institute (DE)
• N.

Chairs

• Kristina Uhlendorf, Sypro Optics GmbH (DE)
• Wilbert Ijzerman, Philips Lighting (NL)

Program Committee

• Kristina Uhlendorf, Sypro Optics GmbH (DE)
• Wilbert Ijzerman, Philips Lightning (NL)
• Jan Werschnik, Jenoptik Optical Systems GmbH (DE)
• Florian Bociort, Delft University of Technology (NL)
• Peter Brick, OSRAM Opto Semiconductors GmbH (DE)
• Alois Herkommer, University of Stuttgart (DE)
• Henning Rehn, OSRAM Opto Semiconductors GmbH (DE)
• Fabian Duerr, Vrije University Brussel (BE)
• Andres Cifuentes, ASE Optics Europe (ES)
• Ramona Eberhardt, Fraunhofer Institute for Applied Optics and Precision Engineering (DE)
• Lars-Christian Wittig, Carl Zeiss AG (DE)

Plenary Speaker

• Tobias Schmidt, OSRAM (DE)

Invited Speakers

• Wang Yongtian, Beijing Ins