Events Archive

TOM 2 – Silicon Photonics

Location: 
Berlin Adlershof, Germany
Part of: 
EOSAM 2014
Duration: 
15 September 2014 - 19 September 2014
Submission Timeframe: 
28 February 2014 - 4 April 2014

TOPICS

Topics include but are not limited to:

  • Design, simulation and fabrication for Si-photonics
  • Optical interconnects
  • High speed, low power PICs
  • Monolithic or hybrid (CMOS-compatible) optical sources and detectors (SiGe, III/V, alt. Mat. etc.)
  • Optical computing
  • Monolithic or hybrid fabrication for photonic structures on Si (3D-Laser-litho¬grahy and nano-imprint, etc.)
  • Nano photonics tailored for Si-Photonics (Photonic Crystals, nonlinear optics, etc.)
  • Assembly and packaging
  • Future Si-photonic manufacturing (e.g. foundry concepts or alternative approaches)

CHAIRS

  • Chair: Ralf Bergmann, Bremer Institut für angewandte Strahltechnik (BIAS) (DE)
  • Co-Chair: Graham Reed, University of Southampton (GB)

PROGRAMME COMMITTEE

  • Antti Säynätjoki, Aalto University (FI)
  • Concita Sibilia, University of Rome (IT)
  • Franz Hutter, Institut für Mikroelektronik Stuttgart (IMS CHIPS), Stuttgart (DE)
  • Gunter Roelkens, Ghent University (BE) 
  • José Capmany, ITEAM Research Institute Universidad Politecnica de Valencia (ES)
  • Klaus Petermann, Technical University, Berlin (DE)
  • Mike Wale, Oclaro Technology Plc. (UK)
  • Roberta Ramponi, Politecnico di Milano (IT)
  • Seppo Honkanen, University of Eastern Finland (FI)
  • Stefan Maier, Imperial College London (GB)
  • Walter Lang, IMSAS, University Bremen (DE)

PLENARY SPEAKER

  • Bert Offrein, IBM Research, Rüschlikon (CH): Photonics for computing applications and the need for electro-optical integration

INVITED SPEAKERS

  • Dries van Thourhout, University of Ghent (BE): III-V integration on silicon: monolithic or bonding?
  • Ivo Rendina, Institute of Microelectronics and Microsystems of CNR-Italy, Napoli (IT): New perspectives in silicon micro and nanophotonics
  • Lars Zimmermann, Leibniz-Institut für innovative Mikroelektronik (IHP), Frankfurt Oder (DE): High-speed photonic electronic integration on silicon for telecom and metro networks
  • Lionel Kimerling, Massachusetts Institute of Technology (MIT), Cambridge (US): The future of Silicon Photonics
  • Martijn Heck, Aarhus University (DK): Integration of Ultra-Low Loss Waveguides with Silicon Photonics    
  • Pol Van Dorpe, IMEC Leuven (BE): CMOS compatible biophotonics based on SiN waveguides

ePIXfab workshop: Fabrication and packaging services in silicon photonics

14:40 EPIC and ePIXfab: How the European industry can exploit silicon photonics?
•         Carlos Lee, EPIC
14:55 Past, present and future of ePIXfab
•         Pieter Dumon, IMEC
15:10 Active & passive waveguide circuits on 220 nm SOI from IMEC and Leti
•         Pieter Dumon, IMEC
15:25 Silicon photonics developed on a SiGe:C BiCMOS pilot line
•         Lars Zimmermann, IHP
15:40 Micron-scale SOI platform for low-loss circuits and broadband I/O coupling
•         Timo Aalto, VTT
15:55 Packaging of silicon photonic chips
•         Timo Aalto, VTT

First EOSAM summer school

Location: 
SUMMER SCHOOL LOCATION CHANGED!
Part of: 
EOSAM 2014
Duration: 
15 September 2014

SUMMER SCHOOL LOCATION CHANGED!

1) HZB/BESSY, Lecture Hall (Room No. 3147)     Albert-Einstein-Straße 15,
12489 Berlin-Adlershof (6 minutes walk from EOSAM location)

2) ADLERSHOF CON. VENT.
RUDOWER CHAUSSEE 17, 12489 Berlin-Adlershof
Room: Newton

The registration will open at 8am on Monday morning at HZB Bessy Lobby (Albert-Einstein-Strasse 15), next to the lecture hall.    


EOSAM 2014 will include for the first time a Summer School on "Novelties in OPTICS and PHOTONICS".

The Summer school will be held on Monday 15th September and is kindly hosted by PTB. The Summer School will include 10 tutorials on topics related to the main sessions (also called TOMs) of EOSAM 2014. The objective is to teach the backgrounds followed by main current applications related to the upcoming TOMs.

4th EOS Topical Meeting on Terahertz Science & Technology (TST 2014)

Location: 
Hotel Cenobio dei Dogi, Camogli, Italy
Duration: 
11 May 2014 - 14 May 2014
Submission Timeframe: 
16 December 2013 - 9 March 2014

Invited Speakers 

  • Hartmut Roskos, Goethe University Frankfurt (DE) – Keynote

 

  • Fritz Keilmann, Ludwig-Maximilians-Universität München (DE) – Masterclass
  • Jun Kono, Rice University (USA) – Masterclass
  • Christoph Deutsch, Technical University Wien / Austria
  • Mona Jarrahi, University of Michigan / USA
  • ​​Michael Johnston, University of Oxford / UK
  • Tobias Kampfrath, Fritz Haber Institute / Germany
  • Toshihiko Kiwa, Okayama University / Japan    
  • Alexey Kuzmenko, Geneva University / Switzerland    
  • Jean-François Lampin, IEMN Lille / France            
  • Joo-Hiuk Son, University of Seoul / Korea
  • Vincenzo Spagnolo, Politecnico di Bari / Italy
  • Frederic Teppe, Université Montpellier 2 / France

1st EOS Topical Meeting on Frontiers in Optical Imaging (FOI 2013)

Location: 
Centre Loewenberg, Murten, Switzerland
Duration: 
16 September 2013 - 18 September 2013

Optical imaging methods play a key role in many fields of science, engineering and in a huge number of everyday applications. FOI 2013 focuses on the most relevant and most challenging of these techniques, with the purpose of advancing the state-of-the-art in domains where the fundamental limits of imaging performance have not yet been achieved.

Final programme: download PDF programme (978 KB)
Registration form: download PDF form (125 KB)

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EOS Topical Meetings at Capri 2013

Location: 
Capri, Italy
Duration: 
12 September 2013 - 14 September 2013

 

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Session III. Micro-Optics and Structured Surfaces (EOSMOC 2013)

Location: 
International Congress Centre Munich (ICM), Germany
Duration: 
13 May 2013 - 15 May 2013
Submission Timeframe: 
9 January 2013 - 23 January 2013

Synopsis

Advancements in technology and innovative manufacturing processes are crucial for optical sector growth in today's global markets. Markets with high developmental momentum include the energy and semiconductor, life sciences, health care and the agri-food industries. Optical technologies play a crucial role in these markets, the importance of sophisticated but economically priced optical components being vital to new products and applications.

The 3rd EOS Conference on Manufacturing of Optical Components, EOSMOC 2013, will highlight significant technology trends, emerging technologies and associated prospective developments. This meeting provides a forum for all aspects of optics fabrication and testing, ranging from micro to large-scale optics and from high value one-off to mass-produced components.

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3rd EOS Conference on Manufacturing of Optical Components (EOSMOC 2013)

Location: 
International Congress Centre Munich (ICM), Germany
Duration: 
13 May 2013 - 15 May 2013
Submission Timeframe: 
9 January 2013 - 23 January 2013

EOSMOC 2013 is held under the umbrella of the WORLD OF PHOTONICS CONGRESS 2013, the leading international congress for optical technologies in Europe (12 - 16 May 2013).
 
Advance programme
Pre-registration is closed, please register on-site at the EOS counter in the entrance hall.

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Session IV. Precise Optics Fabrication (EOSMOC 2013)

Location: 
International Congress Centre Munich (ICM), Germany
Duration: 
13 May 2013 - 15 May 2013
Submission Timeframe: 
9 January 2013 - 23 January 2013

Synopsis

Advancements in technology and innovative manufacturing processes are crucial for optical sector growth in today's global markets. Markets with high developmental momentum include the energy and semiconductor, life sciences, health care and the agri-food industries. Optical technologies play a crucial role in these markets, the importance of sophisticated but economically priced optical components being vital to new products and applications.

The 3rd EOS Conference on Manufacturing of Optical Components, EOSMOC 2013, will highlight significant technology trends, emerging technologies and associated prospective developments. This meeting provides a forum for all aspects of optics fabrication and testing, ranging from micro to large-scale optics and from high value one-off to mass-produced components.

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Session I. High-Volume Manufacturing of Optical Components (EOSMOC 2013)

Location: 
International Congress Centre Munich (ICM), Germany
Duration: 
13 May 2013 - 15 May 2013
Submission Timeframe: 
9 January 2013 - 23 January 2013

Synopsis

Advancements in technology and innovative manufacturing processes are crucial for optical sector growth in today's global markets. Markets with high developmental momentum include the energy and semiconductor, life sciences, health care and the agri-food industries. Optical technologies play a crucial role in these markets, the importance of sophisticated but economically priced optical components being vital to new products and applications.

The 3rd EOS Conference on Manufacturing of Optical Components, EOSMOC 2013, will highlight significant technology trends, emerging technologies and associated prospective developments. This meeting provides a forum for all aspects of optics fabrication and testing, ranging from micro to large-scale optics and from high value one-off to mass-produced components.

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Session V. Testing for Fabrication and Assembly (EOSMOC 2013)

Location: 
International Congress Centre Munich (ICM), Germany
Duration: 
13 May 2013 - 15 May 2013
Submission Timeframe: 
9 January 2013 - 23 January 2013

Synopsis

Advancements in technology and innovative manufacturing processes are crucial for optical sector growth in today's global markets. Markets with high developmental momentum include the energy and semiconductor, life sciences, health care and the agri-food industries. Optical technologies play a crucial role in these markets, the importance of sophisticated but economically priced optical components being vital to new products and applications.

The 3rd EOS Conference on Manufacturing of Optical Components, EOSMOC 2013, will highlight significant technology trends, emerging technologies and associated prospective developments. This meeting provides a forum for all aspects of optics fabrication and testing, ranging from micro to large-scale optics and from high value one-off to mass-produced components.

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