Optics Manufacturing Processes

Location:

International Congress Centre Munich (ICM), Germany

Part of:

2nd EOS Conference on Manufacturing of Optical Components (EOSMOC 2011)

Duration:

23 May 2011 - 25 May 2011

Submission Timeframe:

6 December 2010 - 12 January 2011

General Chair(s):

Martin Forrer - FISBA OPTIK AG / Switzerland

Program Committee:

Lutz Aschke - LIMO - Lissotschenko Mikrooptik GmbH / Germany
Andreas Fischer - AIM Micro Systems GmbH / Germany
David Walker - University College London - UCL / United Kingdom
Klaus-Friedrich Beckstette - Carl Zeiss AG / Germany
Paul Comley - Cranfield University / United Kingdom
Ramona Eberhardt - Fraunhofer Institut Angewandte Optik und Feinmechanik (Fraunhofer IOF) / Germany

Optics Manufacturing Processes is a sub-conference of EOSMOC 2011 - the 2nd EOS Conference on Manufacturing of Optical Components - to be held from 23 - 25 May 2011 in Munich, DE, under the umbrella of the World of Photonics Congress.

Topics

Manufacturing processes: from µ to large optics
Cost-efficient optical components manufacturing
Ultra-stable optical mounting processes
Large scale optics (roll to roll processes etc.)
Integrating references and feedback loops in design, manufacturing, and metrology
Fabrication & testing developments that expand the design horizon
Wafer level optics

Invited Speaker

Ramona Eberhardt, Fraunhofer Institute for Applied Optics and Precision Engineering IOF / Germany

Venue, Travel and Accomodation

www.old.myeos.org/events/eosmoc2011#travel

Registration

www.old.myeos.org/events/eosmoc2011#registration

Paper Publication in JEOS:RP

Attendees of EOSMOC 2011 receive a 20% discount on the publication rate for the Journal of the European Optical Society - Rapid Publications (JEOS:RP). The paper submitted must be an original contribution that is connected to this conference and must be submitted no later than 29 July 2011.

JEOS:RP is a peer-reviewed open-access journal which is listed with ISI Journal Citation Reports [www.jeos.org].

Special publication rates for the attendees of EOSOF 2011: